Peer-Reviewed Journal Details
Mandatory Fields
McDonnell, C,Milne, D,Chan, H,Rostohar, D,O'Connor, GM
2016
June
Optics And Lasers In Engineering
Part 2: Ultra-short pulse laser patterning of very thin indium tin oxide on glass substrates
Published
WOS: 6 ()
Optional Fields
ITO Thin films Laser Ablation Femtosecond OPTICAL-PROPERTIES 2-TEMPERATURE MODEL FILMS ITO
81
70
78
We investigate selective patterning of ultra-thin 20 nm Indium Tin Oxide (ITO) thin films on glass substrates, using 343, 515, and 1030 nm femtosecond (fs), and 1030 nm picoseconds (ps) laser pulses. An ablative removal mechanism is observed for all wavelengths at both femtosecond and picoseconds time-scales. The absorbed threshold fluence values were determined to be 12.5 mJ cm(-2) at 343 nm, 9.68 mJ cm(-2) at 515 nm, and 7.50 mJ cm(-2) at 1030 nm for femtosecond and 9.14 mJ cm(-2) at 1030 nm for picosecond laser exposure. Surface analysis of ablated craters using atomic force microscopy confirms that the selective removal of the film from the glass substrate is dependent on the applied fluence. Film removal is shown to be primarily through ultrafast lattice deformation generated by an electron blast force. The laser absorption and heating process was simulated using a two temperature model (TTM). The predicted surface temperatures confirm that film removal below 1 J cm(-2) to be predominately by a non-thermal mechanism. (C) 2015 Elsevier Ltd. All rights reserved.
10.1016/j.optlaseng.2015.11.008
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